Vertical Graphene Growth on AlCu4Mg Alloy by PECVD Technique
نویسندگان
چکیده
Vertical graphene, which belongs to nanomaterials, is a very promising tool for improving the useful properties of long-used and proven materials. Since growth vertical graphene different on each base material has specific deposition setting parameters, it necessary examine separately. For this reason, full factor design experiment was performed with 26 = 64 rounds, contained additional 5 central points, i.e., total 69 rounds individual experiments, effect input factors Temperature, Pressure, Flow, CH4, Plasma Power, Annealing in H2 aluminum alloy AlCu4Mg. The using plasma-enhanced chemical vapor (PECVD) technology. Mainly, occurrence analyzed, confirmed by Raman spectroscopy, as well its thickness. characterization electron transmission microscopy, including an atomic force microscope. It found that occurred 7 cases thickness affected only interaction flow (sccm) × pretreatment (sccm).
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ژورنال
عنوان ژورنال: Coatings
سال: 2021
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings11091108